Effect of Deposition Conditions on Composition of rf-sputtered Bi-Sr-Ca-Cu-O Thin Films

Ayhan GÜLDESTE

Article Details

Effect of Deposition Conditions on Composition of rf-sputtered Bi-Sr-Ca-Cu-O Thin Films

Authors:

Ayhan GÜLDESTE

Publisher:

TUBITAK

Journal:

Turkish Journal of Physics 1998 Vol.22 Issue 9, pp.901-910

Document Type:

Article

Publication Date:

8/1998

Document Language:

Turkish

Document ID (Org No.):

2000763284

Frequency:

Bimonthly

eISSN:

1303-6122

pISSN:

1300-0101

Keywords:

Abstract:

 

The effect of rf-magnetron sputtering conditions on  as-deposited film composition using a stoichiometric Bi2Sr2CaCu2Oy  (Bi-2212) target was investigated in an on-axis configuration, as the  stoichiometrical control of the film is the most important parameter  for the proper study of film characteristics.  It was found that  substrate target distance up to 55-60 mm may provide a film  composition close to the target composition.  The sputtering chamber  pressure effecting film composition, especially in respect of Bi, is  an important parameter which needs very pracise control.  Bi ratio in  the deposited films increases with increasing Ar pressure while Sr and  Ca are not much affected.  After 12 hours presputtering, a target can  have a steady state for long subsequent period of 60 hours or more.   Target aging and increasing chamber pressure reduce the deposition  rate of the film.  Considerable variation of composition was not  observed over large area of about 4 cm diameter circle.  The peeling  off of films during ex-situ annealing, even at rather low  temperatures, such as below 500°C is also discussed.

 

The effect of rf-magnetron sputtering conditions on  as-deposited film composition using a stoichiometric Bi2Sr2CaCu2Oy  (Bi-2212) target was investigated in an on-axis configuration, as the  stoichiometrical control of the film is the most important parameter  for the proper study of film characteristics.  It was found that  substrate target distance up to 55-60 mm may provide a film  composition close to the target composition.  The sputtering chamber  pressure effecting film composition, especially in respect of Bi, is  an important parameter which needs very pracise control.  Bi ratio in  the deposited films increases with increasing Ar pressure while Sr and  Ca are not much affected.  After 12 hours presputtering, a target can  have a steady state for long subsequent period of 60 hours or more.   Target aging and increasing chamber pressure reduce the deposition  rate of the film.  Considerable variation of composition was not  observed over large area of about 4 cm diameter circle.  The peeling  off of films during ex-situ annealing, even at rather low  temperatures, such as below 500°C is also discussed.

Article Details

Effect of Deposition Conditions on Composition of rf-sputtered Bi-Sr-Ca-Cu-O Thin Films

Authors:

Ayhan GÜLDESTE

Publisher:

TUBITAK

Journal:

Turkish Journal of Physics 1998 Vol.22 Issue 9, pp.901-910

Document Type:

Article

Publication Date:

8/1998

Document Language:

Turkish

Document ID (Org No.):

2000763284

Frequency:

Bimonthly

eISSN:

1303-6122

pISSN:

1300-0101

Turk. J. Phys.

22

(1998)

901-910. Full text: pdf Other articles published in the same issue: Turk. J. Phys.

vol.22

iss.9.

Issues

Article Details

Effect of Deposition Conditions on Composition of rf-sputtered Bi-Sr-Ca-Cu-O Thin Films

Authors: Ayhan GÜLDESTE

Publisher: TUBITAK

Journal: Turkish Journal of Physics 1998 Vol.22 Issue 9, pp.901-910

Document Type: Article

Publication Date: 8/1998

Document Language: Turkish

Document ID (Org No.): 2000763284

Frequency: Bimonthly

eISSN: 1303-6122

pISSN: 1300-0101

Turk. J. Phys.

22

(1998)

901-910. Full text: pdf Other articles published in the same issue: Turk. J. Phys.

vol.22

iss.9.

Issues

Authors:

Ayhan GÜLDESTE

Publisher:

TUBITAK

Journal:

Turkish Journal of Physics 1998 Vol.22 Issue 9, pp.901-910

Document Type:

Article

Publication Date:

8/1998

Document Language:

Turkish

Document ID (Org No.):

2000763284

Frequency:

Bimonthly

eISSN:

1303-6122

pISSN:

1300-0101